The Department of Physics and Astronomy invites all to a colloquium sponsored by OSA\SPIE featuring Dr. Harry J. Levinson, Sr. Director of GLOBALFOUNDRIES’s Strategic Lithography Technology organization and Sr. Fellow. Dr. Levinson will present his talk, “Future Trends in Lithography for Fabricating Integrated Circuits”, Tuesday, February 13, at 4:10 p.m. in Webster 17.
Meet for refreshments before the lecture at 3:45 – 4:10 p.m. in the foyer on floor G above the lecture hall.
The semiconductor industry is poised to insert EUV lithography into high volume manufacturing, a very significant transition. With EUV lithography comes many new challenges for which there are no analogs in optical lithography. The EUV light source is particularly problematic, as are the reflective masks for EUV lithography. Another set of problems arises from quantum-level fluctuations, which contribute to roughness of patterned features, degraded dimensional control, and yield loss. Pellicles for EUV lithography are still in the R&D phase and will likely not be ready for initial manufacturing using EUV lithography. The physics of imaging using EUV lithography leads to much greater complexity for optical proximity corrections. Engineers today are working to resolve these issues and bring about the successful use of EUV lithography in high volume manufacturing.
